Ultrasonic precise cleaning

USシャワー
US SHOWER
Suitable for flat panel and wafer cleaning. Simple configuration and high cleaning efficiency by Multiple Reflection Method comapred to acoustic lense method.

Features

  • Improved cleaning efficiency by 5 times powerful ultrasonic power
    compared to our existing US shower.
  • Available to be equipped in FPD cleaner to realize backside cleaning of substrate.
  • Precise cleaning by Megasonic cleaning of less than 0.2μm particles.
  • Less substrate damage due to high frequency(950kHz).

Specifications

※You can see the entire table by scrolling.

Model 6879BK 7979BK 78BK30-660
Maximum output power 600W 900W 1200W
Frequency 950kHz
Effective area 330mm 495mm 660mm
Liquid volume 20~25L/分 20~30L/分 40~45L/分
Chassis material SUS316L
Plate material SUS316L
Interior treatment Electro-chemical polishing
Heat-resistant temperature 70℃
Connection cable Transducer:5Mx2 Transducer:5Mx3 Transducer:5Mx4
Sensor:5Mx1 Sensor:5Mx1 Sensor:5Mx2
Protection circuit Liquid level warnings (Teflon)
(lower limit)
Weight 5kg 6kg 7kg

※You can see the entire table by scrolling.

※Other types of transducer are customizable.
Please consult with Kaijo or our agent for more information on details.

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