Ultrasonic precise cleaning
- US SHOWER
- Suitable for flat panel and wafer cleaning. Simple configuration and high cleaning efficiency by Multiple Reflection Method comapred to acoustic lense method.
Features
- Improved cleaning efficiency by 5 times powerful ultrasonic power
compared to our existing US shower. - Available to be equipped in FPD cleaner to realize backside cleaning of substrate.
- Precise cleaning by Megasonic cleaning of less than 0.2μm particles.
- Less substrate damage due to high frequency(950kHz).
Specifications
※You can see the entire table by scrolling.
| Model | 6879BK | 7979BK | 78BK30－660 |
|---|---|---|---|
| Maximum output power | 600W | 900W | 1200W |
| Frequency | 950kHz | ||
| Effective area | 330mm | 495mm | 660mm |
| Liquid volume | 20～25L／分 | 20～30L／分 | 40～45L／分 |
| Chassis material | SUS316L | ||
| Plate material | SUS316L | ||
| Interior treatment | Electro-chemical polishing | ||
| Heat-resistant temperature | 70℃ | ||
| Connection cable | Transducer:5Mx2 | Transducer:5Mx3 | Transducer:5Mx4 |
| Sensor:5Mx1 | Sensor:5Mx1 | Sensor:5Mx2 | |
| Protection circuit | Liquid level warnings (Teflon) (lower limit) |
||
| Weight | 5kg | 6kg | ７kg |
※You can see the entire table by scrolling.
※Other types of transducer are customizable.
Please consult with Kaijo or our agent for more information on details.
- Contact InformationInquiries about products
- Please contact us for technical inquiries and technical information from here.